Lateral design of regions with various characteristics of polarization, for example regions with
- Diverse wavelength ranges
- Different polarization axes
- Transmissible or blocked regions
| Shape and size | Circles, rectangles, triangles as well as free-form1) shapes in several sizes |
| Option | Anti-reflection coating to increase transmission and to reduce reflection |
1) On request
Design according to specific customer requirements.
Depending on the number of pieces, the desired pattern as well as the tolerance, three production processes are available
→ Laser
→ Lithographic technology
→ Mosaic technology
Technical data of different technologies
| Mosaic technology | Lithography | Laser | |
|---|---|---|---|
| Wavelength range | 340 – 2.650 nm | 340 – 2.650 nm | 340 – 2.650 nm |
| Contrast ratio | As selected polarizer type | ||
| Resolution of each segment | > 2 resp. 10 mm | Down to 30 µm | Down to 30 µm |
| Orientation of the polarization axes | < 0.5 – 2° | < 0.5° | < 0.5° |
| Edge tolerance | 100 µm | 20 µm | < 1 µm |
| Form | restricted | unrestricted | unrestricted |
| Budget | €€ | €€€ | € |
| Lead time | 6 – 8 weeks | 14 – 16 weeks | 5 – 6 weeks |
colorPol® SLA - Laser structured polarizers
![[Translate to Englisch:] Laserstrukturierter colorPol® Polarisator in Halterung](/fileadmin/_processed_/7/1/csm_colorPol_SLA_706424f05a.png)
With the new laser structured colorPol® SLA polarizer CODIXX introduces the next generation of structured polarizers.
A laser ablates the surface layer containing the silver nanoparticles at selected locations. The result is a structured polarizer with areas that are either transparent or linearly polarizing. The shape and number of these areas can be selected as needed. The resolution can be as low as 25 µm - at very low cost. All regions have the same polarization axis and the same wavelength range.
To create a polarizer with regions of different axes of polarization, at least two of the polarizers described above must be stacked on top of each other (see sketch). The more different polarization axis orientations are needed, the more planes have to be stacked.
Lithographic technology
The polarization of colorPol® polarizers is caused by elongated silver nanoparticles, which are embedded into the glass only in a shallow depth. This specific design offers the possibility to remove these nanoparticles by surface etching. With lithography, this can be done selectively.
A patterned colorPol® polarizer with regions of either transparent or linear polarizing properties is the result. The shape of these regions can be randomly chosen, the resolution can be as high as 30 µm at still reasonable costs. The polarization axis of all regions as well as the wavelength range is same.
To create a polarizer with regions of different polarization axes, at least two of the polarizers, which were patterned as described above, must be stacked on top of each other (see sketch). The more different orientations of the polarization axis are needed, the more planes must be stacked. The different height positions of the planes may cause a parallax.
![[Translate to Englisch:] Schematische Darstellung Lithografieverfahren](/fileadmin/codixx_content/content_pics/Lithographic_technology.png)
Mosaic technology
colorPol® is well suited for this classical method of manufacturing patterned polarizers. Different polarization directions as well as different wavelength ranges can be chosen for each segment. Size, shape and number of segments is limited due to the production process.
The thin glass polarizers are diced precisely, for example with wafer saws. Every single piece is assembled carefully in the desired order. Lastly, the whole mosaic is sandwiched between two carrier substrates.
![[Translate to Englisch:] Herstellungsprozess von strukturierten colorPol® Polarisatoren mit dem Mosaikverfahren](/fileadmin/_processed_/6/d/csm_Mosaic_technology_3_2b6e977d32.png)